Stylus Nano Profiler NS200
The Stylus Nano Profiler NS200 is an ultra-precision contact measuring instrument for measuring surface roughness and microscopic profiles, such as micro-nano step height and film thickness. The NS200 utilizes a displacement sensor with sub-bangstrom resolution, ultra-low noise signal acquisition, ultra-fine motion control, and calibration algorithm technology for outstanding performance.
Its contact force is extremely low and it requires no special equipment to measure surface reflection characteristics, material types, or hardness. Therefore, it is widely used for measuring microscopic surfaces in the semiconductor and compound semiconductor industries, high-brightness LEDs, solar energy, MEMS microelectromechanical systems, touchscreens, automotive, and medical equipment.
Applications
Semiconductor
● Height of the deposited film step
● Height of the step of the resistant thin film
● Measuring engraving speed
●Chemical-mechanical polishing (corrosion, pitting, bending)
Large substrate
● PCB protrusion, step height
● Window covering
● Wafer mask
● Wafer mandrel coating
● polishing plate
Glass substrate and screen
● AMOLED
● Step height measurement during LCD screen development
● Touch panel film thickness measurement; Solar coating thin film measurements
Film on flexible component
● Organic photodetector
● Organic films printed on film and glass. Traces of copper on touchscreens.
| Features | |
|---|---|
| Model No. | NS200 |
| Sample observation | NS200 Front View Navigation - 5 MP Color Camera Field of View: 2.2 x 1.7 mm |
| NS200-D Front View Navigation - 5 MP Color Camera Field of View: 10 x 13.4 mm | |
| NS200-D Side View Navigation - 5 MP Color Camera Field of View: 2 x 2.68 mm | |
| Sensor | Ultra-low inertia LVDC sensor |
| Force measurement | 1-50 mg ajustable |
| Needle | Tip radius 2μm, angle 60° |
| XY travel range | Motorized X/Y leveling (150 mm × 150 mm), manually adjustable |
| Sample stage R-θ | Motorized, 0~360°, continuous rotation |
| Vacuum mandrel | 6-inch vacuum chuck |
| Single scan length | 55 mm |
| Maximum scanning range | 150 (XY travel) 55mm scan range, maximum range is 8 inches |
| Maximum sample height | 50 mm |
| Maximum wafer size | 200 mm (8”) |
| Step height repeatability* | 5 Å @ 330 μm range/ 10 Å @ 1 mm range (measure step height 1 μm, 1 δ) |
| Sensor range*2 | 330 μm or 1050 μm |
| Scanning speed | 2 μm/s ~ 10 mm/s |
| Maximum scan sampling points | 12000 |
| Size (length x width x height) | NS200 - 640×610×500 mm |
| NS200-D - 640x650x530mm | |
| Weight | 40 kilos |
| Input | CA 100~240 V, 50/60 Hz, 200 W |
| Work environment | Humidity: 30~40% RH (non-condensing), Temperature: 16~25°C (fluctuation < 2°C/h), Floor vibration: 6.35 μm/s (1~100 Hz), Audio noise: ≤80 dB, Laminar airflow: ≤0.508 m/s (downflow) |
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